On the basis of comparative analysis of electrical properties of silicon doped with sulfur and nickel respectively at temperature range of 1000-1250°C in 50°C increments and after their subsequent thermal annealing at temperature range of 400-950°C together with control samples of silicon doped with sulfur and nickel, it was revealed that impurity centers of sulfur and nickel do not interact with each other in the matrix of silicon. The absence of such interaction is possibly due to the fact that the electronic configuration of the impurity centers of nickel in the crystal lattice of silicon turns out to be in the filled 3d10 state, which gives it the character of an inert gas. In view of the absence of interaction of sulfur and nickel in silicon, it is concluded that electrically neutral chemically bound complexes in silicon are formed between sulfur substitution centers and centers of transition metal atoms.
Published in | American Journal of Physics and Applications (Volume 6, Issue 3) |
DOI | 10.11648/j.ajpa.20180603.12 |
Page(s) | 76-79 |
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This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited. |
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Copyright © The Author(s), 2018. Published by Science Publishing Group |
Silicon, Electrically Neutral Chemically Bound Complexes, Impurity Centers, Sulfur, Nickel, Transition Metals
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APA Style
Shaikrom Askarov, Sharipov Bashirulla, Srazhev Solizhon, Toshboev Tuchi, Salieva Shokhista. (2018). Impurity State of Transition Group Elements in the Silicon Lattice in the Process of Their Interaction with Sulfur. American Journal of Physics and Applications, 6(3), 76-79. https://doi.org/10.11648/j.ajpa.20180603.12
ACS Style
Shaikrom Askarov; Sharipov Bashirulla; Srazhev Solizhon; Toshboev Tuchi; Salieva Shokhista. Impurity State of Transition Group Elements in the Silicon Lattice in the Process of Their Interaction with Sulfur. Am. J. Phys. Appl. 2018, 6(3), 76-79. doi: 10.11648/j.ajpa.20180603.12
AMA Style
Shaikrom Askarov, Sharipov Bashirulla, Srazhev Solizhon, Toshboev Tuchi, Salieva Shokhista. Impurity State of Transition Group Elements in the Silicon Lattice in the Process of Their Interaction with Sulfur. Am J Phys Appl. 2018;6(3):76-79. doi: 10.11648/j.ajpa.20180603.12
@article{10.11648/j.ajpa.20180603.12, author = {Shaikrom Askarov and Sharipov Bashirulla and Srazhev Solizhon and Toshboev Tuchi and Salieva Shokhista}, title = {Impurity State of Transition Group Elements in the Silicon Lattice in the Process of Their Interaction with Sulfur}, journal = {American Journal of Physics and Applications}, volume = {6}, number = {3}, pages = {76-79}, doi = {10.11648/j.ajpa.20180603.12}, url = {https://doi.org/10.11648/j.ajpa.20180603.12}, eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ajpa.20180603.12}, abstract = {On the basis of comparative analysis of electrical properties of silicon doped with sulfur and nickel respectively at temperature range of 1000-1250°C in 50°C increments and after their subsequent thermal annealing at temperature range of 400-950°C together with control samples of silicon doped with sulfur and nickel, it was revealed that impurity centers of sulfur and nickel do not interact with each other in the matrix of silicon. The absence of such interaction is possibly due to the fact that the electronic configuration of the impurity centers of nickel in the crystal lattice of silicon turns out to be in the filled 3d10 state, which gives it the character of an inert gas. In view of the absence of interaction of sulfur and nickel in silicon, it is concluded that electrically neutral chemically bound complexes in silicon are formed between sulfur substitution centers and centers of transition metal atoms.}, year = {2018} }
TY - JOUR T1 - Impurity State of Transition Group Elements in the Silicon Lattice in the Process of Their Interaction with Sulfur AU - Shaikrom Askarov AU - Sharipov Bashirulla AU - Srazhev Solizhon AU - Toshboev Tuchi AU - Salieva Shokhista Y1 - 2018/06/14 PY - 2018 N1 - https://doi.org/10.11648/j.ajpa.20180603.12 DO - 10.11648/j.ajpa.20180603.12 T2 - American Journal of Physics and Applications JF - American Journal of Physics and Applications JO - American Journal of Physics and Applications SP - 76 EP - 79 PB - Science Publishing Group SN - 2330-4308 UR - https://doi.org/10.11648/j.ajpa.20180603.12 AB - On the basis of comparative analysis of electrical properties of silicon doped with sulfur and nickel respectively at temperature range of 1000-1250°C in 50°C increments and after their subsequent thermal annealing at temperature range of 400-950°C together with control samples of silicon doped with sulfur and nickel, it was revealed that impurity centers of sulfur and nickel do not interact with each other in the matrix of silicon. The absence of such interaction is possibly due to the fact that the electronic configuration of the impurity centers of nickel in the crystal lattice of silicon turns out to be in the filled 3d10 state, which gives it the character of an inert gas. In view of the absence of interaction of sulfur and nickel in silicon, it is concluded that electrically neutral chemically bound complexes in silicon are formed between sulfur substitution centers and centers of transition metal atoms. VL - 6 IS - 3 ER -